Optolong H-alpha 3nm Narrowband Filter
Description
- H-alpha 656.3nm Emission Line
- 3nm FWHM Bandpass
- Anti-Halo Design
Contact us to know when we will receive our next ones!
Free Shipping on most orders above $500*
Free Shipping on most orders above $500*
The Optolong H-Alpha 3nm is a high-performance atmospheric suppression tool designed for high-resolution deep-sky imaging. By restricting the passband to a tight 3nm FWHM (Full Width at Half Maximum), this filter maximizes the signal-to-noise ratio (SNR) of the 656.3nm emission line while aggressively rejecting broadband interference from both artificial light pollution and natural airglow.
In the vacuum of space, ionized hydrogen atoms emit photons at specific energy levels. The most critical for astrophotography is the Hydrogen-alpha line at 656.3nm. This wavelength is the primary indicator of HII regions—massive clouds of ionized gas where star formation occurs.
Because H-alpha light penetrates interstellar dust more effectively than shorter wavelengths, using a dedicated 3nm filter allows for the mapping of high-density structural filaments in emission nebulae that are typically obscured in broadband RGB imaging.
The transition from a standard 7nm filter to a 3nm bandwidth provides a measurable increase in contrast by narrowing the "window" of permitted light:
Optolong utilizes Ion-Assisted Deposition (IAD) to apply the interference coatings. This vacuum-deposition process results in a high-density coating that is superior to standard evaporated films.
A common failure in narrowband filters is the presence of internal reflections around bright stars. The Optolong 3nm series utilizes a non-cemented optical substrate. By manufacturing the filter from a single piece of high-quality optical glass rather than laminating multiple layers, the number of internal reflective surfaces is halved.
When combined with precision anti-reflection (AR) coatings, this design ensures that the H-alpha signal is transmitted with >90% efficiency while maintaining an optical density of >OD4 in the out-of-band regions, virtually eliminating reflections and halos.
| Central Wavelength (CWL) | 656.3 nm |
| FWHM (Bandwidth) | 3 nm |
| Peak Transmission | >90% |
| Blocking Range | 300–1100 nm |
| Optical Density (OD) | >OD4 |
| Substrate | Polished Optical Glass |
| Surface Quality | 60/40 (MIL-O-13830) |
Filter
× 1